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ready solutions for vacuum
coating Factory test and pre-qualified vacuum reactor chambers for various deposition plasma processes:  Plasma
Enhanced Chemical
Vapour Deposition (PECVD) Physical
Vapour Deposition (PVD) /Sputtering Reactive
Ion Etching (RIE)Non-plasma reactor chambers and modules also available: Atomic
Layer Deposition (ALD) Thermal
EvaporationCustom
design,
fabrication, integration and test of assemblies and modules ready for
“plug and play” with any mainframe or
 E21
style cluster tool configuration.Custom vacuum chamber With
vast experience in various process
chamber and reactor cell design
we can prepare custom designs to
meet
the most demanding processing conditions:
Specialist in large vacuum
chamber (>
200L) fabrication.. True UHV
system (<5E-10 mbar,
bakeable to 200 Deg C). Optimised
chamber designs in relation
to conductance and gas
loading to ensure the most cost effective pumping
system selection. Ambient
and pressure control systems
design to deliver any
specific processing conditions i.e. <1ppm O2 or H20.We
will recommend best
pumping solutions for your process taking into account your
requirements, gas loads and conductance in order to achieve
vacuum levels ranging from rough vacuum to UHV. We also provide a leak
detection service.
Ultra High Purity precursor delivery systems. . Fully Qualified to customer specifictions . Design, assembly and integration of subsystems . Instruments selection i.e. MFCs, MFM, valving and manifolds. . Flow measurement and control . Up-stream / Down-stream vacuum pressure control . RGA and other ambient control
compliant, S2, E49, F1, F2, etc
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